CIQTEK FIB SHOW: Dual-Beam Electron Microscope Facilitates 28mm Chip Process Analysis
Based on the Dual-beam Electron Microscope DB550 independently controlled by CIQTEK, the Transmission Electron Microscope (TEM) nanoscale sample preparation of 28nm process node chips was successfully achieved. TEM verification can clearly analyze the key dimensions of each structure, providing a domestic precision detection solution for semiconductor process defect analysis and yield improvement.